Reactor Types
Metrology Capability
Technical Support


To support the epitaxial deposition process, GlobiTech designed and constructed a 125,000 square foot facility. Designed to support the environmental requirements for the epitaxial deposition process, this facility will support future product growth expansion plans. Currently in production, Fab 1 houses an 8,000 square foot Class-1 cleanroom for 100mm through 200mm epi wafer production. To support future capacity expansion; a structural shell for Fab 2 cleanroom, a mirror image of Fab 1, has been completed. The cleanrooms are designed using a ballroom equipment configuration. Waffle deck flooring is incorporated to provide uniform airflow throughout the room.

The facility is equipped with the following systems to support the cleanrooms and the epitaxial process:

  • True Class-1 cleanroom design with three level construction and waffle deck on cleanroom level.
  • Ultrapure DI-Water System
  • Bulk process gas and chemical delivery.
    • Liquid Hydrogen
    • On-site Nitrogen generation with Liquid Delivery backup.
    • TCS by ISO Trailer
    • HCl by Tube Trailer
    • SC1/SC2 clean chemistry by drums or totes.
  • Ultrapure piping installations for gas and chemical delivery.
  • Specially designed reactor exhaust abatement and control.


GlobiTech's factory was designed to employ the most advanced factory management systems. Automation and CIM (Computer Integrated Manufacturing) systems allow single wafer tracking throughout the factory, resulting in obtaining process history of every wafer throughout the process. Single wafer data combined with real-time statistical process control facilitates high quality and lower cost of ownership.  GlobiTech’s CIM capabilities include:

  • Process and metrology tool automation - recipe download, state control, data collection, and slot level wafer tracking.
  • Wafer level tracking by RFID throughout the fab.
  • Automated data collection and storage in an Oracle database.
  • Real time SPC for critical production parameters.

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